Development of a computer model representing low temperature thin film growth

Abstract

During this study, growth of thin solid films was considered. A simple growth model, valid at low substrate temperatures, was proposed and it was solved by means of analytical techniques. In particular, an expression was obtained for the area coverage Am(t) as a function of the layer number m and time t. Subsequently a computer program was developed, using the programming language MATLAB, to simulate thin film growth at low temperatures. Program was coded in such a way to calculate the area coverage while the growth proceed. Results obtained by means of computational methods are in excellent agreements with that obtained by analytical techniques.